Ferroelectric Dielectrics Integrated on Silicon

Ferroelectric Dielectrics Integrated on Silicon

English | 2011 | 457 Pages | ISBN: 1848213131 | PDF | 28.7 MB

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films.



[Fast Download] Ferroelectric Dielectrics Integrated on Silicon

Related eBooks:
Adaptive Digital Circuits for Power-Performance Range beyond Wide Voltage Scaling: From the Clock Pa
Advanced Digital Signal Processing and Noise Reduction
Noise in Radio-Frequency Electronics and its Measurement
Handbook of Optimization in Electric Power Distribution Systems
Power Plant Equipment Operation and Maintenance Guide
Power Electronics
Learning, Control and Hybrid Systems
Artificial Intelligence for Robotics
Цифровая схемотехника. 2-е издание
Test Equipment for TV and Satellite Reception (Home Digital Systems Book 11)
The DIY Guide to Computer Hardware
Advanced Smart Grid Functionalities Based on PowerFactory
Copyright Disclaimer:
This site does not store any files on its server. We only index and link to content provided by other sites. Please contact the content providers to delete copyright contents if any and email us, we'll remove relevant links or contents immediately.